Method of creating a design on a helmet

ABSTRACT

A method of creating a design on complex curves and irregular contours of a protective helmet, quickly and without having to first disassemble the helmet. A design is transferred to a clear film/acetate, which is then exposed onto a photoresist mask, transferring the design to the photoresist mask. The mask is washed out creating blast-able areas in the design mask. The mask is adhered to an area of the helmet, which is otherwise covered with a sealed protective bag. Sandblasting/abrasive-blasting etches portions of the helmet surface through the blast-able area of the mask. Various colors or other special effects may be painted/applied onto the etched portions of the helmet surface. The protective bag and photoresist mask can be removed, and the painted areas buffed/polished in a final step.

FIELD OF THE INVENTION

The present invention is directed to decorating a motorcycle helmet (orsports helmet, e.g., baseball, football, snow, skate, bicycle, etc.),and more particularly to a method of economically creating custom andpersonalized designs on all types of protective helmets.

BACKGROUND OF THE INVENTION

Designs on motorcycle and other helmets are typically done duringmanufacturing and involve a process where a print is made, and appliedto the helmet with water transfer method, for example, then the helmetreceives a clear coat of lacquer to protect it.

This is all done on the outer shell prior to the helmet being assembled.This process makes custom designs highly uneconomical and individualchanges to standard designs cannot be made.

The secondary way to apply a design on a helmet is to remove all trim,and hardware, sand the helmet down completely and then repaint it with adesign and then again apply a clear coat of lacquer and then replacingall trim and hardware. This is a time-consuming and usually expensivemethod that also relies on the individual painter's skill rather than aprinted process.

There remains a need for a more economical way to apply a design to aprotective helmet which enables custom work without requiring the skillof an artisan every time.

SUMMARY OF THE INVENTION

It is an object of the present invention to provide methods of creatinga design on complex curves and irregular contours of a helmet quicklyand without having to disassemble the helmet.

A method of creating a design on complex curves and irregular contoursof a protective helmet, quickly and without having to first disassemblethe helmet. A design is transferred to a clear film/acetate, which isthen exposed onto a photoresist mask, transferring the design to thephotoresist mask. The mask is washed out creating blast-able areas inthe design mask. The mask is adhered to an area of the helmet, which isotherwise covered with a sealed protective bag.Sandblasting/abrasive-blasting etches portions of the helmet surfacethrough the blast-able area of the mask. Various colors or other specialeffects may be painted/applied onto the etched portions of the helmetsurface. The protective bag and photoresist mask can be removed, and thepainted areas buffed/polished in a final step. Thus the helmet has hadno dismantling, gluing, or otherwise potentially invasive work thatcould cause damage, add extra weight or compromise the safety andoriginal factory build quality, very important as helmets are certifiedsafety products from the manufacturer and any disassembly or assembly bynon-qualified individuals would certainly void any warranties.

A further understanding of the nature and advantages of the inventionwill become apparent by reference to the remaining portions of thespecification and drawings.

BRIEF DESCRIPTION OF THE DRAWINGS

Features and advantages of the present invention will become appreciatedas the same become better understood with reference to thespecification, claims, and appended drawings.

FIG. 1 is an elevational view of a backside of a motorcycle helmetadjacent a “mask” having a design of a lion printed on a photoresistfilm;

FIG. 2 shows the photoresist film adhered to the helmet;

FIG. 3 shows taping around the film with the helmet placed in a thickplastic bag and the film area cut out and taped;

FIG. 4 illustrates a photoresist mask applied to complex curves, ventsand a shield of the helmet;

FIG. 5 schematically illustrates a sandblaster abrading portions of atopcoat paint layer of the helmet only within areas not covered by thephotoresist mask;

FIG. 6 is a dose-up sectional view of the paint layer being removed withsandblasting;

FIG. 7 schematically illustrates a cleaning phase after abrasion of thetopcoat paint layer using compressed air;

FIG. 8 illustrates application of a bonding agent layer to the maskedarea;

FIG. 9 shows initial application of a diluted color layer;

FIG. 10 is a close-up sectional view showing the color layer beingadded;

FIG. 11 illustrates application of a full-strength layer of color.

FIG. 12 indicates addition of any special color, flake, or metallicaccent;

FIG. 13 shows the fully painted helmet after removal of the photoresistmask; and

FIG. 14 schematically illustrates light buffering, cleaning, andpolishing of the helmet.

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

The present application is directed to methods of applying or creating adesign on a cycle helmet; in particular, a motorcycle helmet. Of course,the present application can be utilized for any number of helmets, suchas for bicycling, skiing, hockey, baseball, football, etc.

The process begins with creating a design in the computer with anillustrative program such as Adobe Illustrator. The design is thenprinted on a specialized clear printing acetate.

The printed acetate film is then put together with a photosensitive maskmaterial. This photoresist mask is quite bendable, stretches and has aself-adhesive. The acetate design and the photoresist Mask material areplaced in an UV Light exposure unit to “expose” the photosensitive maskmaterial.

The photosensitive mask is then washed out with warm water leaving aclear area to “blast” in. The blue portion that does not wash out blocks(masks) the area for blasting.

The photoresist mask is then positioned onto the helmet.

FIG. 1 schematically illustrates the backside of a helmet adjacent a“mask” with a design. The mask is a photoresist film mask. Any desiredimage may be transferred to the photomask (or photoresist film) as anydesigner can understand.

FIG. 2 shows the photoresist film mask (shown in blue for contrast)adhered to the helmet. The photoresist mask acts as a stencil orpatterned mask allowing selected unmasked portions of the helmet to beremoved (e.g., by sandblasting/abrasive-blasting) while other maskedportions remain intact. In the illustrated embodiment, the regions ofthe helmet under the darker portions of the photoresist mask are exposedand susceptible to abrasion, while the lighter colored regions are not.The blue photoresist sheets are not only sticky on one side but they arequite stretchy and flexible in all directions so that they can hold tothe helmet. Also, the adhesive does not leave any residue that mightdamage the helmet.

FIG. 3 shows taping placed around the film, and then the helmet isplaced in a sealed thick plastic protective bag with the film area cutout and taped. This protects other areas of the helmet with the bag, andonly the area on which the photoresist mask has been applied is exposed.The helmet is masked everywhere so that none of the silica gets in thehelmet or the vents etc.

FIG. 4 shows that the photoresist mask can be used on complex curves,vents, and the shield. Since a helmet is a complex curved surface, anappropriate material that can stretch and curve and stick is necessary.

FIG. 5 illustrates an abrasion phase. Recessed portions are formed by asandblasting process. Abrasion is only into the clear topcoat and paintlayer if required of the helmet through the areas of the photoresistmask that do not protect the helmet. The sandblasting gun iscontrollable to etch down to specific depths from a few microns tomillimeters. A shallower abrasion may be required for a subtle design inthe helmet. Color may also be added into the etching process includingmetallic particles, flakes, and chrome effect. Or a matte or shiny clearcoat may be applied to achieve matte design on a gloss helmet or viceversa.

The sandblasting is done in a booth that can use any pressure and flowof any abrasive material required. A suitable sandblasting machine is aGuyson SBP40 model 6.

FIG. 6 indicates in cross-section a close-up view of the paint layerthat is removed with sandblasting.

In addition to using a photo resist film as described, the process ofsandblasting/abrasive blasting a design into the clear coat and possiblythe paint of a helmet can also be achieved by utilizing stencils madefrom self-adhesive vinyl for larger, simpler areas that do not requirethe minute detail.

FIG. 7 schematically illustrates a cleaning phase. After the mask issandblasted. compressed air is used to remove any dust and debris fromaround the helmet and masking. The area that has been sandblasted isthen wiped and degreased to be ready for color application.

Subsequently, in FIG. 8, a bonding agent is applied. One layer ofbonding agent is lightly applied to the masked area, as painters willunderstand.

FIG. 9 shows application of a first layer of color. Preferably, adiluted color layer is applied.

FIG. 10 is a dose-up cross-section shoving where and how the color layeris added.

FIG. 11 shows application of the final layer of color. A full-strengthlayer of color is then applied to give an opaque finish. A clear coatlayer/hardener is sometimes added at this point depending on the finalresult desired. The paint is applied using a high volume/low pressuresystem which allows the paint to be sprayed extremely fine so that itcan penetrate and adhere to very small areas.

In FIG. 12, any desired special color, flake, metallic effects, etc. isadded.

Finally, in FIG. 13 the mask is removed carefully with a damp, softcloth. Preferably, the amount of paint added matches the amount ofmaterial that has been removed during the abrading process so that thefinal surface is even and smooth, as opposed to convex or concave. Thiscan be further controlled by fine polishing of the finished surface.

FIG. 14 indicates a light buffing of the helmet with appropriate buffingagents.

Those skilled in the art will appreciate that various changes andmodifications may be made to the preferred embodiments, the invention inits broader aspects is not limited to the specific details,representative devices, and illustrative examples shown and described.

It is claimed:
 1. A method of forming a design on a helmet, comprising:transferring a design to a photoresist mask; exposing the photoresistmask to create an open area with the shape of the design; adhering thephotoresist mask to an area on a helmet; securing a protective coveraround the helmet except over the photoresist mask;sandblasting/abrasive-blasting the photoresist mask to etch portions ofthe helmet underneath the open (blast-able) area; applying paint to theetched portions of the helmet; removing the protective cover andphotoresist mask from the helmet; and buffing the painted etchedportions of the helmet.